> Dear Octavian,
> You can try to use 200 to 300nm Tungsten as mask(for
> abt 30min without peeling) or ARP 325 Positive
> resist
> for short time use <30min.
>
> Have a try. Good luck.
>
> regards,
> Venkat
> Hamburg University of technology(www.tuhh.de)
> microsystems department

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