Hello,

have you searched the SpinWeb database of published papers? Coburn and
Winters are a good start for review papers on RIE.

http://ojps.aip.org/spinweb/

-----Ursprüngliche Nachricht-----
Von: Josef Kouba 
An: [email protected] 
Datum: Donnerstag, 26. Februar 2004 16:00
Betreff: [mems-talk] RIE of sub-micron Si structures


>
>within my project I have to fabricate Si-square-structures with the
>dimensions of approximately 200x200nm and the depth of 200nm. My experience
>in RIE of Si is zero.
>we have the oxford Plasmalab 80 Plus machine and within my standard process
>I use CHF3 and O2.

I think would have to do some process development yourself, since etching
rates depend also on the type of sample, open area, and in general on the
chamber conditions.
Is chlorine chemistry an option for you?

Good luck, Burkhard