Hi,

The Plasmalab 80Plus has been used for a range of sub-micron structures,
including diffraction gratings and photonic crystals, so should be capable
of achieving your 200x200nm holes.  You do not mention the type of mask you
are using for this.  If you have PMMA (e-beam written) you should be aware
that this has less plasma resistance than conventional Novolak resists, so
could cause problems. You may need to reduce the amount of oxygen if the
resist is going too fast.

Regarding the comment on Chlorine - we would not recommend using chlorine in
an open load system such as the Plasmalab80Plus, unless you were using a
nitrogen glove-box on it.

Martin (Oxford Instruments Plasma Technology)

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