A well prepared SU-8 pattern can withstand most of the strong acids even at
elecvated temperature. From experience, SU-8 didn't seem to be seriously
affected by HF or HNA. But beware of the possibility of SU-8 peeling off from
the wafer if the etching time is extended.

regards

Han Chong

>Date:          Wed, 3 Mar 2004 22:32:23 -0800 (PST)
>From:          Haroon Lais  [add to >address book]
[protect or block sender]
>Subject:       [mems-talk] SU-8 on strong acid
>To:    [email protected]
>Reply To:      General MEMS discussion 

>Hello all,

>Do anyone know that SU-8 can stand strong acid like HF, HNA >?

>I want to use the SU-8 as the mask layer on patterning >Silicon.
>also, do anyone know what kind of polymer will stand on >strong acid like HF,
or HNA?

>thank you,
>Haroon





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