The following are references to Reactive Ion Etching of Pyrex and other
sodium containing glasses:

1) Xinghua Li, Takashi Abe, Masayoshi Esashi, Deep reactive ion etching
of Pyrex glass using SF6 plasma, Sensors and Actuators A 87 (2001)
139-145.

2). Takanori Ickhiki, Yoshinari Sugiyama, Takekazu Ujiie, Yasuhiro
Horike, Deep dry etching of borosilicate glass using fluorine-based
high-density plasmas for microelectromechanical system fabrication, J.
Vac. Sci. Technol. B 21(5), Sep/Oct 2003, 2188-2192

3) L. Dubost, A. Belinger, J. Perrin, R.W. Boswell, Low temperature
pulsed etching of large glass substrates, J. Vac. Sci. Technol. A 21(4),
Jul/Aug 2003 892-894

4) Shen Ronggui, Giancarlo C. Righini, Characterization of reactive ion
etching of glass and its applications in integrated optics, J. Vac. Sci.
Technol. A 9(5), Sep/Oct 1991 2709-2712

Roger Shile

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of
[email protected]
Sent: Monday, March 15, 2004 12:39 PM
To: Kirt Williams; General MEMS discussion
Subject: Re: [mems-talk] Anisotropic etching in Pyrex glass

Roger:

Can you remember who was able to etch a couple of hundred microns in
Pyrex using ICP systems. I have such systems and have not been able to
etch anything approaching that depth. Bob Henderson

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