Dear all,

I tried to remove SU-8 by O2 plasma with adding a little bit CF4 but there are
some gray residues left after it was etched. The experiment condition I used is
80% O2 with 20% CF4 at 300 W in 300 mtorr. These residues can be scratched by
the razor but cannot be blew away by nitrogen gun. I also found that after
etching the height of SU-8 section is little lower than that of the other
sections (glass slide). I am not sure are these residues the product of glass
etching or just remnant of SU-8?
Could anyone give me some suggestions to remove these residues without making
damages to the substrate?
Your kind respond will be highly appreciated!

Ted