Hi All,

     I am about to do KOH etch on <100> silicon wafer,
the feature size is about 50um. I am planning to use
silicon oxide as mask for KOH etch. Due to the mask, I
have to use negative photoresist to pattern the oxide.
Since I have no much experience in negative resist,
could you guys recommend some resist for me? The specs
are: silicon oxide ~1um, the spin-on resist should
withstand HF etching, exposure wavelength
350nm~450nm,feature size ~50um. Thanks.




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