Hi all, my name is abhiram govindaraju and i am currently working on a
research project which involves testing of the mechanical properties at
the micron scale specimens.
i would like to know if anyone has used a photoresist layer as a
sacrificial layer to make SU-8 specimens at the micron scale, say 100 x
20 x 5 microns.

for the SU-8 specimens, releasing such small specimen is a problem as
the cantilever beam does not have enough stiffness and they start to
curl over.Si02 can't be used as a sacrificial layer as BHF would react
and effect the SU-8 structure while we use it to etch of the Si02 layer.

so i thought why not go for a very low material properties photoresist
layer which can be used as a sacrificial layer.so could any one of you
help me in finding the right material and the right etchant to remove
the sacrificial layer.

thanking you.

regards
abhiram.