Hi all !

I'm working on a CMOS MEMS structure release lately, which using the metal
layer as main structure
and oxide as sacrificial layer. And I'm looking for etchants that provides
good selectivity between
oxide and Al, and between polysilicon and oxide.
I knew that there's Pad-etch 4 and high desity HF for etching oxide without
attacking Al; but it's hard
for me to get them, is there any etchant else you can suggest me¡H
And is TMAH a good choice for etching polysilicon without attacking oxide¡H
THANKS a lot!!!

Best Regards

Juin


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