Why not to use lift-off if you can reduce the Al thickness to ~100nm.

----- Original Message -----
From: "Zannitto, Peter J." 
To: 
Sent: Friday, April 02, 2004 12:23 AM
Subject: [mems-talk] wet etch of Al


>
> My structure consists of 250nm PMMA / 700nm of Al / 1um SiO2.
>
> I have done e-beam lith on the PMMA layer and developed.  I now want to
etch the Al down to the SiO2.
>
> Can anyone recommend an Al etchant that should be used in these
circumstances?  The selectivity of the etch between the Al and the PMMA
should be as high as possible.
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