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MEMSnet Home: MEMS-Talk: Problem with aluminium sputtering
Problem with aluminium sputtering
2004-04-05
Tomi Meilahti
2004-04-05
adnan merhaba
2004-04-05
Ravi Mullapudi
2004-04-06
Greg Chance
Light Boron diffusion in silicon
2004-04-06
Dau Thanh Van
2004-04-06
Shane Arthur McColman
2004-04-06
Mark Wendman
2004-04-07
Roger Brennan
2004-04-05
Gary
Problem with aluminium sputtering
Gary
2004-04-05
Tormi, It is very difficult to tell you what is going on, not having all
the information.  However, the window thru which you are looking should be
getting coated with aluminum making it impossible to observe much after a
few moments of deposition.  If you are striking a plasma, then my guess is
that the gas conditions in the chamber are not proper.  Too little argon
perhaps, or too much water vapor, etc. Gary

-----Original Message-----
From:   Tomi Meilahti [SMTP:[email protected]]
Sent:   Monday, April 05, 2004 8:33 AM
To:     [email protected]
Subject:        [mems-talk] Problem with aluminium sputtering

Hi everybody,
We recently purchased an aluminium target for the companys rather old
Leybold-Heraeus (model Z 400 I think) sputtering system. The problem is I
can?t find working sputtering parameters for it. Either there is no
aluminium coating on the test wafer at all or then the coating is of very
dark colour. The process looks OK when I look through the small windows on
the chamber walls. I?ve tried varying sputtering pressure and voltage. Any
ideas or suggestions would be greatly appreciated.
Best regards
Tomi Meilahti
Metorex International Oy
Nihtisillankuja 5
02631 Espoo
Puh: 09 32941316
Fax: 09 32941301
E-mail: [email protected]
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