Try KOH at 60°C
>
> My structure consists of 250nm PMMA / 700nm of Al / 1um SiO2.
>
> I have done e-beam lith on the PMMA layer and developed.  I now
want to etch the Al down
to the SiO2.
>
> Can anyone recommend an Al etchant that should be used in these
circumstances?  The
selectivity of the etch between the Al and the PMMA should be as high
as possible.
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