Hi,



I need to do a RIE etch in a AlGaAs/GaAs material using Cl2/Ar. I will
have to etch in depths of about 50nm with etch rates about 30 nm/min.



If someone has information about recipes that works well with this
technology please let me know.



The recipe that I use at the moment is 40 W rf power, 10 mTorr, 3 sccm
Cl2, 40 sccm Ar. I have problems with surface roughness and unstable
etching rates.



Best regards,

Michael Juhl