Dear Gavin,

you shouldn't fill in the beaker and immediately apply to the wafer. Better use
a
small bottle and let it stand for some hours, at best over night, before
applying
the resist from it.

Antje

Gavin Wu schrieb:

> Dear all,
>
> I am a novice on using SU-8. I've ordered MicroChem 2025 and tried to
> spin-coat a 2" wafer. Since SU-8 is really thick and sticky, I applied it onto
> the wafer surface before spinning with a small beaker instead of a pipette. I
> also slowed down the accelerating ramp of the spinning chuck. But I've never
> been able to get a uniform layer or smooth surface without streaks. I know the
> problem might be in the bubbles generated when applying the SU-8, which is
> kinda unavoidable. Anyone has a better idea on the *tool* (I mean beakers,
> pipettes, etc) for applying SU-8? Or anyone know the secret of getting a
> uniform layer?
>
> I guess the answer could be somewhere in the archive. But I just need an
> answer really quickly. Thanks very much.
>
> Gavin
>
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/