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MEMSnet Home: MEMS-Talk: RE: Glass trench etch
RE: Dry etching GaAs
2004-04-26
Michael Marrs
RE: Glass trench etch
2004-04-26
Michael Marrs
RE: Glass trench etch
Michael Marrs
2004-04-26
Lisen-

Your etch rate will probably be on the order of 0.2 microns per minute using
a fluorocarbon/oxygen mixture. You should use a chromium mask, if you have
the capability, as you will find that using photoresist will be problematic.


Michael Marrs
Process Engineer
Trion Technology
+1 (480) 968-8818 ext. 25
[email protected]



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