ear sir,

I would like to know if I can use SU-8 2002 or SU-8 2007 as an
etch/protective mask for RIE, (using SF6 gas during the RIE process)?
The process will look like as follows:

Spin coat    3000 rpm/ 60 sec
Softbake     65C / 1 min, 95C / 2 min
UV exposure for pattern transfer
PEB             65C / 1 min, 95C / 2 min

Dry etch polymer using RIE in SF6 gas environment.

Your kind reply is highly appreciated.
Best regards,
Abang Annuar Ehsan