Abang,

Yes you can, as a matter of fact it will be a pretty good mask.
Selectivities I have seen range from comparable to better that standard
Photoresist. Be careful not to temperature shock the exposed resist as
cracks will appear everywhere and ruin your mask.

Jobert an Eisden
SUNY Albany

-----Original Message-----
From: Abang Annuar Ehsan [mailto:[email protected]]
Sent: Monday, April 26, 2004 8:54 PM
To: mems-talk
Subject: [mems-talk] SU-8 as etch/protective mask for RIE (SF6)


ear sir,

I would like to know if I can use SU-8 2002 or SU-8 2007 as an
etch/protective mask for RIE, (using SF6 gas during the RIE process)?
The process will look like as follows:

Spin coat    3000 rpm/ 60 sec
Softbake     65C / 1 min, 95C / 2 min
UV exposure for pattern transfer
PEB             65C / 1 min, 95C / 2 min

Dry etch polymer using RIE in SF6 gas environment.

Your kind reply is highly appreciated.
Best regards,
Abang Annuar Ehsan




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