Hi Manjula,
You can use a low pressure chemical vapor deposition
(LPCVD) nitride or Au/Cr for deep and long KOH
etching.

Regards,
Mahdi Bagheri

manjula raman  wrote:
 I need some information of some etch mask other than
silicon dioxide for KOH etching.I am doing a long
duration etching(atleast 5 hrs)and using a thick
thermally grown oxide mask.But, the sides of my wafer
start etching out.I have tried PECVD Nitride as mask
but that does not help.Is there any resist i can apply
to the edges of my wafer during the last 1-1.5hrs of
my etching
Manjula
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