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MEMSnet Home: MEMS-Talk: SU-8 as etch/protective mask for RIE (SF6)
SU-8 as etch/protective mask for RIE (SF6)
2004-04-27
Abang Annuar Ehsan
2004-04-27
Jobert van Eisden
2004-04-27
[email protected]
SU-8 as etch/protective mask for RIE (SF6)
[email protected]
2004-04-27
I would highly recommend using SU-8 for your SF6 process. We have developed a
silicon etch and the selectivities with SU-8 vs. positive thicker resists is
much higher. We do not do the second bake and keep the temperature of the resist
low during processing so cross-linking is not a problem. In fact we ash it off
in the same chamber when we are through with the DRIE silicon etch. Bob
Henderson


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