Hi,

I am trying to make a photomask with 0.8 micron
feature size. I use e-beam to generate the pattern on
PMMA. And I try to etch it into Cr. I used CR-12S to
etch Cr(1000A). I found PMMA is lifted off. So I am
searching for other possibility of etching, like dry
etching. The PMMA layer is about 1500A thick. Can
someone give me some suggestion? I wonder how people
make mask in companies.
Thanks a lot.

Jie

PhD, University of Minnesota





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