Hello All,

I was wondering whether anyone can help me.  I am currently processing 260micron
SU8-2100 layers on Silicon substrates.  I have tried the suggested procedure by
microchem but did not get the results I wanted.  I have also gotten procedures
from
other groups in the literature but many are quite different to each other.  I am
especially
concerned about the exposure times which varies a lot from different groups.
Has
anyone had experience in processing layers this thick with good results and
could share
their procedure or experiences.

Any input will be greatly appreciated.

Thank you.

Christian Antonio
Research Student
Industrial Research Institute Swinburne,
Australia.