You need (110) wafers.
See "An Introduction to Microelectromechanical Systems Engineering" by Nadim
Maluf, p. 63.

----- Original Message -----
From: "Nancy Lahoud" 
To: 
Sent: Thursday, May 13, 2004 7:06 AM
Subject: [mems-talk] Anisotropic Si wet etching


> Good day all,
>
> I am wondering if anyone can help me with the following question by
perhaps pointing me to the appropriate litterature:
>
> I would like to etch vertical trenches in silicon substrates using wet
etch solutions such as KOH. To what angle with respect to the major flat do
I need to pattern my trenches in order to ensure that my sidewalls are
vertical (i.e. 90 degrees)?
>
> Your help is much appreciated!
>
> I thank you in advance...
>
> Best regards,
>
> Nancy
>
>
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