Dear Sir
I use I-line sub-micron phtotresist for LIL with 325nm HeCd laser
Such as TOK THMR, Shipley Ultra-i 123
My target pattern is holes or pillars matrix
Period 300nm, Diameter 100nm
However, the resolution is not good enough
Can I try DUV photoresist?
Or any one batter for me?
Thank you

Best regard