Hi,

        I am wondering if anyone has an electronic copy of the following
journal paper and wouldn't mind to forward it to me. Thank you very much!


Title: A model of the chemical processes occurring in CF4/O2 discharges
used in plasma etching

Author(s): Plumb, I.C.; Ryan, K.R.

Journal title: Plasma Chemistry and Plasma Processing

Volume and Issue number: vol.6, no.3

Inclusive page numbers: 205-30

Publication year: 1986


Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 888-4567, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic