Hi Luke
Unfortunately the abiliity to write large areas and achieve good resolution
are rarely acievable in one machine unless you go to the state of the art
mask making machines which I would have thought are in the multi-million
pound region. If you are looking at good resolution (less than 10nm at the
beam, although what this equates to on the resist will depend on type and
thickness) over a small write field for R&D purposes, then Raith gmbh can
retrofit a standard SEM. Or if you can stretch the budget will supply a
turnkey system with their stage fitted. This will cover larger areas, but is
not really feasible to write masks unless you want a tiny fraction of the
total mask area written. For mask applications, you can buy relatively cheap
writers if resolution is not an issue. Heidelburg instruments also make
machines to make masks and direct write wafers, and claim good resolution,
but not sure of costs.
Good luck
-----Original Message-----
From: Hunter, Luke L [mailto:[email protected]]
Sent: 09 June 2004 18:40
To: '[email protected]'
Subject: [mems-talk] E-beam writers
Hi all,
Could someone give me a good idea as to how much a e-beam writer might cost
for direct write R&D and mask making? Throughput can be low since we're not
to worried about speed however the system should have good resolution near
60 or 70 nm.
Thanks
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/