Hi Luke,
The basic rule of thumb for e-beam writing in resist is the resolution is
dictated by the larger of either e-beam size or about 10-15% of the thickness of
resist you are using, due to e-beam scattering in the resist. Therefore resists
which claim inherent 10 nm resolution are good only to this level if the resist
layer is thinner than 100 nm and the e-beam size is 10 nm or less.
I hope this helps.
Best of luck,
Fred Thomas
-----Original Message-----
From: [email protected] [mailto:mems-talk-
[email protected]] On Behalf Of Campe, Steve
Sent: Friday, June 11, 2004 2:23 AM
To: 'General MEMS discussion'
Subject: RE: [mems-talk] E-beam writers
Hi Luke
Unfortunately the abiliity to write large areas and achieve good resolution are
rarely acievable in one machine unless you go to the state of the art mask
making machines which I would have thought are in the multi-million pound
region. If you are looking at good resolution (less than 10nm at the beam,
although what this equates to on the resist will depend on type and
thickness) over a small write field for R&D purposes, then Raith gmbh can
retrofit a standard SEM. Or if you can stretch the budget will supply a turnkey
system with their stage fitted. This will cover larger areas, but is not really
feasible to write masks unless you want a tiny fraction of the total mask area
written. For mask applications, you can buy relatively cheap writers if
resolution is not an issue. Heidelburg instruments also make machines to make
masks and direct write wafers, and claim good resolution, but not sure of costs.
Good luck
-----Original Message-----
From: Hunter, Luke L [mailto:[email protected]]
Sent: 09 June 2004 18:40
To: '[email protected]'
Subject: [mems-talk] E-beam writers
Hi all,
Could someone give me a good idea as to how much a e-beam writer might cost for
direct write R&D and mask making? Throughput can be low since we're not to
worried about speed however the system should have good resolution near 60 or 70
nm.
Thanks
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