You can use TMAH as etchant  or silicon nitride as  etch mask. Cr/Au layer is
good mask for KOH etching
Elena
BlueBird Optical MEMS

-----Original Message-----
From: mems-talk-bounces+elena.sidorov=bluebird-optical-mems.com@memsnet.org
[mailto:mems-talk-bounces+elena.sidorov=bluebird-optical-mems.com@memsnet.org]On
Behalf Of mahdi bagheri
Sent: Monday, June 14, 2004 4:34 PM
To: [email protected]
Subject: [mems-talk] Etching Problem


Hello,

I want to etch silicon using SiO2 mask. At the
temperature of 85 (C), after 75 minutes, KOH attacks
to the SiO2 mask. The etchant solution is water: 80
cc, Isopropyl alcohol: 20 cc, koh: 30 gr. What can I
do to etch silicon?

Regards,
Mahdi Bagheri




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