Hi,
The etch rate in BOE is about 0.1 um/min [Madou, 1997]
and you can use glass container for etching in KOH.
Regards,
Mahdi Bagheri

--- Dhanamjaya R Guda  wrote:
>
>
>
>
> I have a question  regarding the SiO2 etching which
> I am planning to use as
> the mask.
>     I want to use BOE as the etchant.Does any one
> have any particular idea
> about the etch rate of SiO2 in BOE ( what would be
> the concentration
> profile). and
>    what conatiner can i use for etching of Silicon
> using KOH.
> I would really appriciate if any one go a head and
> answer to these
> questions.
>
> Thanks,
> Dhanamjaya Reddy Guda
> Louisiana State University,
> Department of Mechanical Engineering
> Ph.No: 225-578-4412
>
>
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