Dear Colleagues,
I am looking for a thin resist (300nm), resistant to acetone and
trichloroethylene, that can be easily etched with O2 plasma.
I plan to use it in a bilayer configuration PMMA/resist. I will transfer
patterns defined by e-beam lithography by etching the resist with O2
plasma. All the process must be made at low temperature (T<140°C). I
already tried Su 8, but it was too rough after O2 plasma for my process.
Does anyone ever heard about such a resist?
I would be very pleased for any suggestion,
Thanks a lot,
Olivier Boulle