I suggest running an SF6 + O2 plasma clean every 5-10 um to eliminate oxide
buildup that eventually flakes off.
You  probably have more than 10 um of buildup, so you might want to do a
mechanical scrub first.
After cleaning, deposit ~0.5 um of coating oxide so that subsequent
depositions are more repeatable.
    --Kirt Williams

----- Original Message -----
From: "Shantanu" 
To: 
Sent: Monday, July 05, 2004 6:11 PM
Subject: [mems-talk] PECVD Silicon dioxide


>
> I am using oxford plama 80+ PECVD system to grow silicon dioxide on
silicon. After every growth flaky material deposits on the wall of the
chamber. Does anyone know anything about this?
>
> Best Regards
> Shantanu
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