I would like to use a chlorine based dry process to etch Aluminum
Nitride (170nm). Can I use photoresist (S1818 or any other kind) as the
etch mask?  Any information in this regard will be greatly helpful.
Thank you.

Yeswanth L Rao
Graduate Research Assistant
Micro/Nano Fabrication Laboratory
Driftmier Engineering Center
University of Georgia
Athens, GA 30602