Ciao Kamal,

you can use a negative photoresist called SU-8 100 from micro resist
technology.
With 3 krpm during 30 sec, you can have a thickness of 100 micro. Its
spectral sensitivity is i-line 365 nm.

Regards,

Amandine KUBIE

-----Message d'origine-----
De: "Kamal Yadav" 
A: "General MEMS discussion" 
Date: 20/07/04
Objet: Re: [mems-talk] AlN dry etching

Does anybody know how to get a 100 um thick layer of polymers on
silicon.
Polymers like polyimide, PMMA, Photoresist, PVA.

Thanks

Kamal Yadav
Graduate Student
Rose Hulman Institute of Technology,
Indiana 47803

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