Ralph -
Acetone probably will not do a very good job of removing your greases. We
have a patented technology we have used to clean numerous MEM, Semi and
relate parts. It works with any fluid with a vapor pressure.
In a typical process all step take place automatically within a single
vacuum chamber. This technology is a "Dry-In - Dry-Out" process, where the
first step in the cycle is the removal of air from the chamber thus
eliminating the air-part surface interference barrier. This not only creates
an ultrapure process environment but allows cleaning fluid to get to
otherwise difficult to reach contaminates.
Next, the selected cleaning fluid is introduced in the chamber covering
the parts. Bubbles are caused to grow by pulling a vacuum on the fluid
until the vapor pressure of the fluid is reached. At this point a non
condensable gas is introduced into the chamber causing the bubbles to
implode releasing energy directly on the surface dislodging contaminates and
particulates. As the vacuum pressure starts to rise, the liquid containing
contaminates and particulates is automatically removed from the cleaning
chamber. The growing and imploding of bubbles with the corresponding release
of energy directly ON the surface is programmable (by vacuum torr, rate and
temperature) and may be repeated as often as needed to obtain the desired
clean performance required. Upon completion of the Vacuum CavitationT
process the cleaning system introduces a final rinsing fluid where Vacuum
CavitationT may also be applied. Upon completion of the final rinse,
devices are vacuum dried spot-free and with no watermarks. The vacuum
chamber is then released back to atmosphere, signaling the end of the
process cycle.
If you think this might be of use to you feel free to contact me at
[email protected] or 480-813-1110 x16.
Good luck.
Jack
-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Ralph Hinkley
Sent: Wednesday, July 21, 2004 11:47 PM
To: [email protected]
Subject: [mems-talk] HIgh vacuum grease removal
Dear MEMS colleagues,
I'm having difficulties removing the high vacuum grease.
High vacuum grease is used in attaching small samples to a dummy wafer for
Si deep etch process.
After the deep etch process, I managed to detach the samples in acetone,
but totally removing the grease with acetone seems impossible.
Can anyone shed some light on?
I'm using Dow corning high vacuum grease.
Regards.
Ji.
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