Hi all,

       I am have got the silicon microreactor where i have coated a catalyst on
the channels and now i woud like to do the anodic bonding to the coated
reactor(silicon wafer)

i was trying to do it at 400 Centigrade and also at 650 volts ..0 current.and i
coudnt bond the pyrex glass to the coated reactor ! but i could bond the pyrex
glass to the emplty reactor (without catayst at the same condictions) may be the
coated reactor is rough to do the anodic bonding !

how can i get the bonding to the coated reactor ? is there any method we can
bond the glass to coated reactor which is somewhat rough when compared to
uncoated reactor?

Please help me i am struct here.

Thanking You,

Krishna Mohan Adivi.




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