Francois,

You may want to fine an academic group with experience in SEM analysis of
similar structures.  They may have knowledge of charge trapping, electron
tunneling, etc. in similar structures.  MIT has an excellent electron microscopy
group, on a smaller scale Stevens Institute of Technology has a very good TEM
group with some decent SEM experience as well, they may be able to help.

Good luck,
Matt

-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf Of Francois Montaigne
Sent: Tuesday, August 17, 2004 8:31 AM
To: [email protected]
Subject: Spam:[mems-talk] Ebeam lithography on glass substrates


Hi,
We are currently trying to do Ebeam lithography on metallic layers (about
10 nm thick). We use PMMA resist and 30 keV electron energy. Whereas we
obtain good results with silicon substrates (18-30 ohm.cm), the patterns
are dramatically rounded on glass substrates. Can it be du to a dramatic
proximity effect on glass? We rather suspect that some charges are trapped
in the substrate despite the conductive metallic layer between the
substrate and the resist. Does some of you have any experience with Ebeam
lithography on glass or insulator substrates or can advise any reference on
that subject?
Regards
Francois

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