I need to etch ITO thin films in a photolithography process of
fabricating a semiconductor device.

The main task of this photolithography process is to etch ITO film but
not to etch an Al film which is under the ITO film.
So I need the ITO etchant which is highly selective to Al.


Best regards,
Shelegeda Eugenie
Research Assistant
P.N. Lebedev Physical Institute
Moscow, Russia