Tim,
You can try 17% HCL to etch ITO films, try to keep your etchant at constant
temp, maybe 25 degrees +/- 1 degree. A resist mask of any positive-tone
variety will work, S1813, AZ4400, etc. Etch rate should be somewhere around
30-60 Ang/min, which is pretty slow.
- Justin
Justin C. Borski
MEMS Program Manager
Advanced MicroSensors Inc.
[email protected]
-----Original Message-----
From: Krueger, Bernd (Unaxis Optics BZ)
[mailto:[email protected]]
Sent: Tuesday, August 31, 2004 3:57 AM
To: 'General MEMS discussion'
Subject: AW: [mems-talk] Wet Etch ITO Coated Glass
Hello Tim,
Once I have tried etching ITO on Glas with NH4HF2 and it works, but the Glas
will also etched. Unfortunately the etched regions on the substrate became
matt.
Bernd Krueger
-----Ursprüngliche Nachricht-----
Von: [email protected]
[mailto:[email protected]]Im Auftrag von Kinney, Tim Scott
(UMC-Student)
Gesendet am: Dienstag, 27. Juli 2004 04:52
An: [email protected]
Betreff: [mems-talk] Wet Etch ITO Coated Glass
I am interested in wet etching ITO coated glass for a research project I am
involved in. I am looking specifically for products and a procedure to wet
etch ITO coated float glass. Since the pattern I will be using does not
require high definition, I will be using a printed transparency as my mask.
I will have access to spin coating equipment as well. I have been told the
basics, but I have had a hard time finding specific information about what
kind of resist, developer, and solvent to use. Any information will be very
helpful and appreciated.
Thank you,
Tim
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