Re: Rép. : [mems-talk] Metal Lift off using LOR 20 B and Shipley 1813
Laetitia Philippe
2004-10-04
sorry i don't know
Dr Laetitia Philippe
Electrochemistry and Micro-patterning Group
EMPA
Feuerwerkstrasse 39
CH-3602 Thun
Tel 41 (0)332285249
>>> [email protected] 10/04 4:42 am >>>
Hello Laetita,
First of all thank you very much for your prompt reply. I am using
Microchem LOR 20 B along with Shipley 1813 . Do
you think it is possible to get 2 um Cu lift off on 5 um features using LOR 20
B and Sphipley 1813 PR .Please let me know ,
Thank you very much,
Sincerely,
Dipankar Ghosh
----- Original Message -----
From: "Laetitia Philippe"
Date: Tue, 28 Sep 2004 16:42:15 +0200
To:
Subject: Rép. : [mems-talk] Metal Lift off using LOR 20 B and Shipley 1813
> Hi Dipankar,
>
> which can of solution is this commercial product? what is the
> composition of your feature above the Cu/Cr layer?
>
> Dr Laetitia Philippe
> Electrochemistry and Micro-patterning Group
> EMPA
>
> Feuerwerkstrasse 39
> CH-3602 Thun
>
> Tel 41 (0)332285249
>
> >>> [email protected] 09/28 5:11 am >>>
> Hi all,
> I am trying to do a lift off of 2 um Cu / 200 A Cr layer with 5
> um features using a bi layer lift off process using Microchem LOR 20 B
> and Shipley 1813. Does anybody have any experience using this .Could you
> pls share your process details.
> Also what are the limitations of aspect ratio on bi layer
> photolithography process? Is it possible to do 3 um features of 2 um
> thick metal using this process.
> Thanks in advance,
> Dipankar Ghosh
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