A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Photoresist for Patterning Aluminum
Photoresist for Patterning Aluminum
2004-10-05
Vivek Mukhatyar
2004-10-05
Shay Kaplan
teflon glue...
2004-10-05
Venkatachalam Chokkalingam
2004-10-05
William Lanford-Crick
2004-10-05
aasutosh dave
2004-10-05
rakesh babu
photopatternable silicone biocompatibility
2004-10-06
[email protected]
2004-10-05
Bill Moffat
Photoresist for Patterning Aluminum
aasutosh dave
2004-10-05
Vivek,

Each photoresist have a spin-speed curve in the application sheet. So
in order to get  a thicker photoresist you can spin coat it at less
rpm. But the best is to check out the application data sheet from the
industry you get the photoresist. Try using Phosphoric acid, along
with acetic acid and nitric acid. You can get a direct Al etch
solution too from companies. Also heating you the solution will lessen
the etching time.


Let me know if you need to know anything more about the process.

- Aasutosh Dave

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMS Technology Review
The Branford Group
Addison Engineering
Process Variations in Microsystems Manufacturing