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MEMSnet Home: MEMS-Talk: how to spincoat a 50nm thin uniform film of AZ9260?
how to spincoat a 50nm thin uniform film of AZ9260?
2004-10-18
Z. Jiang
2004-10-18
Isaac Wing Tak Chan
2004-10-18
Isaac Wing Tak Chan
2004-10-18
Borski, Justin
2004-10-19
Z. Jiang
2004-10-20
narges afshari
2004-10-19
Z. Jiang
2004-10-19
Isaac Wing Tak Chan
how to spincoat a 50nm thin uniform film of AZ9260?
Borski, Justin
2004-10-18
You should try contacting AZ.  The problem is probably in that AZEBR is not
the resist solvent, it is the edge bead solvent.  There is probably a
specific resist-dilution solvent for the AZ9200 series.  Also, you might
consider starting from AZ9220 which coats to 2um and thin from there instead
of starting with the thickest version they offer.

- Justin

-----Original Message-----
From: Z. Jiang [mailto:[email protected]]
Sent: Monday, October 18, 2004 11:29 AM
To: [email protected]
Subject: [mems-talk] how to spincoat a 50nm thin uniform film of AZ9260?


hi,

   I need to spin-coat a layer of very thin (~50nm) AZ9260 photoresist.
Normally AZ9260 is for thickness range 4um to 25um. By adding AZEBR thinner
to a certain ratio (from 1:5 to 1:50), it can be diluted and spin-coated to
sub-micron thickness. However, the film formed by the diluted solution will
always contain some big black polymer beads which seriously harm the
quality of the film. Does anyone have similar experience and can tell a
little bit information on how to avoid this problem? Thanks a lot.

   Jiang
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