how to spincoat a 50nm thin uniform film of AZ9260?
Isaac Wing Tak Chan
2004-10-18
Btw, can you get the PGMEA solvent to dilute your photoresist? This is the
solvent for AZ resist. I don't know if you can get it easily, but I hope
it is a possible solution.
Yours sincerely,
Isaac Chan
Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 888-4567, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic
On Mon, 18 Oct 2004, Isaac Wing Tak Chan wrote:
> Jiang,
>
> Is there a particular reason that you need to use AZ9260? Can you use a
> less viscous photoresist like AZ3312? 50nm is really thin. Even AZ3312 is
> still in the range of 500nm. Why don't you contact Clariant Corp. for
> choosing the right product for you. Check out www.clariant.com for
> customer service number.
>
>
> Yours sincerely,
>
> Isaac Chan
>
> Ph.D. Candidate
> Dept. Electrical & Computer Engineering
> University of Waterloo
> 200 University Ave. W
> Waterloo, Ontario, Canada
> N2L 3G1
> Tel: (519) 888-4567, ext. 6014
> Fax: (519) 746-6321
> [email protected]
> http://www.ece.uwaterloo.ca/~a-sidic
>
>
> On Mon, 18 Oct 2004, Z. Jiang wrote:
>
> > hi,
> >
> > I need to spin-coat a layer of very thin (~50nm) AZ9260 photoresist.
> > Normally AZ9260 is for thickness range 4um to 25um. By adding AZEBR thinner
> > to a certain ratio (from 1:5 to 1:50), it can be diluted and spin-coated to
> > sub-micron thickness. However, the film formed by the diluted solution will
> > always contain some big black polymer beads which seriously harm the
> > quality of the film. Does anyone have similar experience and can tell a
> > little bit information on how to avoid this problem? Thanks a lot.
> >
> > Jiang
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