Hi, Isi,

I did liftoff process to make electrodes on microscope glass slide. The
trick which you may want to try is to bake the glass or quartz after
cleaning to get rid of moisture, then I remember that I spinned HMDS on
one side of the glass first, baked dry and then spinned HMDS and AZ5214
on the other side for further development. The HMDS on the first side is
to prevent water attacking the other side when developing. I got
reasonable success from this, some electrodes (IDT) structures stayed on
glass.

Xinyu Li

-----Original Message-----
From: Abhulimen Isi [mailto:[email protected]]
Sent: Tuesday, October 19, 2004 8:59 AM
To: [email protected]
Subject: [mems-talk] Problems with liftoff(on quartz)


Hi,

 I am having problems with developing photoresist on quartz wafer. The
photoresist is not sticking to the quartz. I am making using of TLM mask
for the photolithographic prosess. I need the smallest seperation in the
pattern (2um separation).Has anyone experienced similar problems? In
particular, with AZ 5214E which i want to use for patterning metal using
liftoff. The procedure that i followed is:

a) organic cleaning of wafer(acetone(30s) then methanol(30s))
b) spin-on HMDS+AZ5214
c) soft back @ 90C/60sec
d) Expose for 15sec
e)Develop for 30s

 Your help is deeply appreciated.

 thanks

Isi Abhulimen



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