question about dry etching of silica nanoparticle using
PMMA as mask
deal sea
2004-10-22
Hi,
Does anyone has the experience to use PMMA photoresist as mask to dry-etch the
silica nanoparticle (or SiO2)? What is the selectivity? What gas should I use?
If it is not possible to use PMMA as photoresist, what kind of metal and gas
should I use to do the dry etching of SiO2?
Also have the the same question to dry etching the In2O3 and SnO2.
Thank you for the answer at your convenience!
Have a good weekend!
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