Hi,

Does anyone has the experience to use PMMA photoresist
as mask to dry-etch the silica nanoparticle (or SiO2)?
 What is the selectivity? What gas should I use?

If it is not possible to use PMMA as photoresist, what
kind of metal and gas should I use to do the dry
etching of SiO2?

Also have the the same question to dry etching the
In2O3 and SnO2.

Thank you for the answer at your convenience!

Have a good weekend!

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