Stella,

It sounds like your TiW adhesion layer is an organic layer since you are
using all the organic solvents to remove it. I had been using a special
organic residue remover to clean my RIE polymer residue. You may come to
see me for details.


Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 888-4567, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic



On Mon, 25 Oct 2004, Stella Chang wrote:

> Hi all,
>
> We are trying to etch a TiW adhesion layer on an Alumni substrate using
> Clariant's TiW etchant.  We're observing a residue film (pinkish on the
> white Alumina) that can be rubbed off using a Q-tip.  However, we don't
> know how to remove this film from our patterned substrates.  We've tried
> acetone, stripper, and RIE in an oxygen plasma, but the film remains.
> It seems manually wiping off the film has the best results, but this
> ruins the structures (1.5um of Au with TiW adhesion layer).
>
> Has anyone observed this in the past?  Btw, we believe this film may
> have something to do with having left the light-sensitive TiW etchant in
> the light for too long.  The residue also remains after being dipped in
> fresh TiW etchant at 37C.
>
> Thank you for your time!
>
> Stella Chang
> University of Waterloo
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/
>