Hi Alexander-

Successful results using the CPD technique can be accomplished by varying
dehydraytion times, number of alcohol changes and it is also worth trying
various alcohols as there have been cases where one type alcohol will yield
better results than other alcohol types.

Best Regards-
Yianni


....Innovation and Quality...
      www.tousimis.com

----- Original Message -----
From: "Xu Zhu" 
To: "General MEMS discussion" 
Sent: Wednesday, October 27, 2004 1:30 AM
Subject: RE: [mems-talk] Sticking of fragile MEMS structures


> Try to use vapor HF etch system.
>
> Xu
>
> -----Original Message-----
> From: Oudalov, A. (EL) [mailto:[email protected]]
> Sent: Sunday, October 24, 2004 12:50 PM
> To: '[email protected]'
> Subject: [mems-talk] Sticking of fragile MEMS structures
>
> Hi there,
>
> I am trying to release a comb drive structure etched by deep reactive
> ion
> etching (DRIE) on a SOI silicon wafer. I try to make very thin gaps
> between
> the comb drives to have a large electrostatic force. Since the spring
> constant of my supporting structure is small I get problems when I
> release
> the chips in buffered hydro-fluoric acid (BHF). The adjacent combs stick
> permanently and the device is broken. I also tried critical point
> drying,
> the yield is little higher but not satisfactory. Who knows about
> another,
> more gentle method to release my combs?
>
> Thanks a lot,
> Alexander
>
>
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