Hi
I am trying to etch silicon wafer in KOH to create 50 nm thick silicon
nitride membranes. I am using 20% KOH at various tempretures. the
membranes I am getting often easily break in the process. Can anyone give some
advice how to proceed?. Which type of nitrade is the best for this
application?
Also, I would be grateful if someone could suggest a good and not very expensive
vendor
who could provide me with the 4" silicon wafers ( preferably 300 mic
thick) with 100nm low stress LPCVD silicon nitride layer.
Our in-house facilities produce a very porous silicon nitrade films.
Please reply directly to me at
[email protected]
Thanks in advance
Maryla Krolikowska
Australian National University
