Allen,

You may read this reference for some hints on the morphology of sputtered
film:

J. A. Thornton, "The microstructure of sputter-deposited coatings," J.
Vac. Sci. Technol. A 4, pp.3059 (1986)


Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, N2L 3G1, Canada
Tel: (519) 888-4567, ext. 6014
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic
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My experience is on a-Si:H TFT design and semiconductor processing:
http://resumes.hotjobs.com/iwchan2004/procengineer6yr
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On Sun, 7 Nov 2004, FENG Chun Hua wrote:

> Dear Members,
>    Did any body have experience in controlling the morphology of the
> sputtered film on a porous/smooth substrate? I wonder one or more
> sputtering parameters may achieve discontinuous/continuous film. Any
> suggestion will be greatly appreciated.
>
> Allen
>
>
> --
>
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