You might try a product called PiRL.

Unlike photoresist, PiRL will remain soluble in developer after exposure to
high temperatures.

> From: zhiyanl 
> Reply-To: General MEMS discussion 
> Date: Mon, 8 Nov 2004 10:10:28 -0700
> To: General MEMS discussion 
> Subject: [mems-talk] Metal Lift-off
>
> Dear friends:
>
> I got a trouble when doing metal lift-off with very small feature size. I
> deposited Ti/Au on the patterned PR and then tried to lift off. The feature
> size if about 8~10um. But even i soaked it in the acetone for very long time,
> the PR still can't be stripped off. It seems the metal not only covered the
> top of the PR but also the side wall. I am wondering if you have any idea and
> suggestions on how to strip off the PR.
>
> Thank you very much.
>
> Zhiyan
>
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