Hoang,

Are you using a RIE or an Ion Mill?  You mention both.  There is no beam in
a RIE.  If you are using an RIE "Reactive Ion Etcher" than I have
had very good results using a HeNe reflected off my substrate into a photo
detector connected to a chart recorder.  It is easy to see when you
have milled through one layer of a material and hit another one.

Brent

Original Message:
-----------------
From: Hoang T Nguyen [email protected]
Date: Fri, 12 Nov 2004 16:10:27 -0800
To: [email protected]
Subject: [mems-talk] mass spectrometer for RIE end point detection


Hi,

I am looking for an end point detection method for a reactive ion beam
etching process.  In the process, we have a photoresist mask atop a
SiO2/Hf02 multilayer stack.  We are trying to transfer etch the photoresist
pattern into the SiO2 top layer, but stopping the process once we reach the
HfO2 underlying layer.


Would you recommend a technology to try.

Many thanks,
The ion beam is made up of Ar, O2, and CHF3 plasma.

Hoang Nguyen
Laser Scientist
Lawrence Livermore National Laboratory
[email protected]
408.623.9456
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